Santa Clara, Calif.-based semiconductor manufacturing equipment market leader Applied Materials Inc. today launched its new 45-nm photomask etch technology, dubbed Centura Tetra III Advanced Reticle ...
SANTA CLARA, Calif.--(BUSINESS WIRE)--March 28, 2006--Applied Materials, Inc. today announced that Elpida Memory, Inc., a leading DRAM manufacturer, has selected the Applied Centura(R) AdvantEdge(TM) ...
SANTA CLARA, Calif.--(BUSINESS WIRE)--July 12, 2005--Applied Materials, Inc. today launched the industry's most advanced silicon etch technology, the Applied Centura(R) AdvantEdge(TM) system, ...
SANTA CLARA, Calif. — Applied Materials Inc. today (Sept. 10, 2003) entered into the photomask metrology market with a new tool for the 65-nm node. The RETicleSEM system from Applied is a CD-SEM tool ...
Applied Materials and Lam Research are top players in semiconductor deposition and etch equipment, with AMAT leading in deposition and LRCX in etch. AMAT holds a broader product portfolio and stronger ...
SANTA CLARA, Calif., Feb. 28, 2023 (GLOBE NEWSWIRE) -- Applied Materials, Inc. today introduced a new eBeam metrology system specifically designed to precisely measure the critical dimensions of ...
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